Chemical Vapor Deposition Stocks List
Symbol | Grade | Name | % Change | |
---|---|---|---|---|
0NX3 | A | ASM International NV | 8.33 | |
HDD | C | Hardide Plc | 0.00 | |
0JT5 | D | Lam Research Corporation | 0.18 |
Related Industries: Chemicals
Related ETFs - A few ETFs which own one or more of the above listed Chemical Vapor Deposition stocks.
Symbol | Grade | Name | Weight | |
---|---|---|---|---|
ITEC | D | SPDR® MSCI Europe Technology UCITS ETF | 4.57 | |
HNSS | D | HSBC NASDAQ Global Semiconductor UCITS ETF USD GBP | 4.44 | |
ESIT | D | iShares MSCI Europe Information Technology Sector UCITS ETF | 4.23 | |
SMH | D | VanEck Semiconductor UCITS ETF | 4.06 | |
SMGB | D | VanEck Semiconductor UCITS ETF | 4.06 |
Compare ETFs
- Chemical Vapor Deposition
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-κ dielectrics.
The term chemical vapour deposition was coined 1960 by John M. Blocher, Jr. who intended to differentiate chemical from physical vapour deposition (PVD).
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